本文为提高膜蒸馏传质过程效率，在新型热电制冷平板式膜蒸馏组件的基础上，对新型半导体冷腔的制冷性能进行了分析,通过对具有不同旋向结构参数的热容腔数值模拟计算，获得2mm小空间膜热容腔近膜面处的流场和温度场，比较分析不同边界层涡量值和温度梯度,数值计算结果表明： 具有开槽宽度3mm，角度60°的分水盘的涡量值为0.088(1/S)，温度梯度0.02(℃/mm)，该结构削弱了膜面处边界层的温度极化和浓度极化，为研究提高膜蒸馏传质通量方法的物理机制奠定了基础。
 

 In order to improve the membrane distillation and its mass transfer efficiency, this article bases on the new thermoelectric refrigeration of flat plate type membrane distillation and analyzes the performance of the new cold chamber semiconductor. It mainly carries out a numerical simulation analysis for the difference among many handed structure parameters of heat fault cavity, obtains 2mm membrane heat fault cavity flow field and temperature field. A comparative analysis with different value of boundary layer vortices and temperature gradient. The simulated results show that: groove width is 3mm, vortices value of 60°angle diversion of water disk is 0.088(1/S), temperature gradient is 0.02(℃/mm),it weakens the temperature polarization and concentration polarization of outside the boundary layer at the membrane surface , it lays the foundation for improving the membrane distillation and its mass transfer fluxes methods physical mechanism.

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